Microwave ECR Plasma Assisted MOCVD of Y2O3 Thin Films Using Y(tod)3 Precursor and Their Characterization

Barve, S.Deo, M.Kar, R.Sreenivasan, N.Kishore, R.Biswas, A.Bhanage, B.Rao, M.Gantayet, L. M.Patil, D.2012-01-182012-01-182011Plasma Processes and Polymers, 2011. Vol. 8 (8): pp. 740-749http://hdl.handle.net/123456789/57084607 bytestext/htmlenMicrowave ECR PlasmaMOCVDY2O3 Thin FilmsYttrium oxidemetal organic chemical vapour depositionX-ray photoelectron spectroscopyMicrowave ECR Plasma Assisted MOCVD of Y2O3 Thin Films Using Y(tod)3 Precursor and Their CharacterizationArticle