The effect of pulse width on asymmetric bipolar pulse DC sputtered tantalum pentoxide thin films

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dc.contributor.authorHaque, S. M.
dc.contributor.authorTripathi, S.
dc.contributor.authorDe, R.
dc.contributor.authorMisal, J. S.
dc.contributor.authorShinde, D. D.
dc.contributor.authorRao, K. D.
dc.contributor.authorSahoo, N. K.
dc.date.accessioned2020-09-04T07:01:37Z
dc.date.available2020-09-04T07:01:37Z
dc.date.issued2017
dc.description.divisionO&TFL-V;A&MPDen
dc.format.extent4239 bytes
dc.format.mimetypetext/html
dc.identifier.sourceAIP Conference Proceedings, 2017. Vol. 1832: Article no. 080047en
dc.identifier.urihttp://hdl.handle.net/123456789/20536
dc.language.isoenen
dc.subjectTa2O5en
dc.subjectsputteringen
dc.subjectellipsometryen
dc.subjectpulse DCen
dc.titleThe effect of pulse width on asymmetric bipolar pulse DC sputtered tantalum pentoxide thin filmsen
dc.typeArticleen

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