Thin film coating of silicon carbide on zircaloy-4 tube by FCVD process and a study on its kinetics

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dc.contributor.authorMandal, D.
dc.contributor.authorDabhade, P. A.
dc.contributor.authorChougule, B. K.
dc.date.accessioned2022-06-17T07:03:52Z
dc.date.available2022-06-17T07:03:52Z
dc.date.issued2021
dc.description.divisionAMMDen
dc.format.extent4856 bytes
dc.format.mimetypetext/html
dc.identifier.sourceJournal of Nuclear Materials, 2021. Vol. 552: Article no. 152996en
dc.identifier.urihttp://hdl.handle.net/123456789/24660
dc.language.isoenen
dc.subjectFluidization enhanced chemical vapor depositionen
dc.subjectAccident tolerant fuel claddingen
dc.subjectDiscrete particle methoden
dc.subjectComputational fluid dynamicsen
dc.subjectSilicon carbideen
dc.subjectZircaloy-4en
dc.titleThin film coating of silicon carbide on zircaloy-4 tube by FCVD process and a study on its kineticsen
dc.typeArticleen

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