Effect of O2/Ar gas flow ratio on the optical properties and mechanical stress of sputtered HfO2 thin films

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dc.contributor.authorJena, S.
dc.contributor.authorTokas, R. B.
dc.contributor.authorMisal, J. S.
dc.contributor.authorRao, K. D.
dc.contributor.authorUdupa, D. V.
dc.contributor.authorThakur, S.
dc.contributor.authorSahoo, N. K.
dc.date.accessioned2016-03-04T05:55:35Z
dc.date.available2016-03-04T05:55:35Z
dc.date.issued2015
dc.description.divisionA&MPDen
dc.format.extent4913 bytes
dc.format.mimetypetext/html
dc.identifier.sourceThin Solid Films, 2015. Vol. 592: pp. 135-142en
dc.identifier.urihttp://hdl.handle.net/123456789/12579
dc.language.isoenen
dc.subjectHfO2 thin filmen
dc.subjectSputteringen
dc.subjectOptical propertiesen
dc.subjectResidual stressen
dc.titleEffect of O2/Ar gas flow ratio on the optical properties and mechanical stress of sputtered HfO2 thin filmsen
dc.typeArticleen

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