Growth of few layered molybdenum disulphide
dc.contributor.author | Om Prakash | |
dc.contributor.author | Mahajan, A. | |
dc.contributor.author | Bedi, R. K. | |
dc.contributor.author | Saxena, V. | |
dc.date.accessioned | 2020-03-06T09:05:19Z | |
dc.date.available | 2020-03-06T09:05:19Z | |
dc.date.issued | 2019 | |
dc.description.division | TPD | en |
dc.format.extent | 3924 bytes | |
dc.format.mimetype | text/html | |
dc.identifier.source | AIP Conference Proceedings, 2019. Vol. 2115: Article no. 030616 | en |
dc.identifier.uri | http://hdl.handle.net/123456789/20383 | |
dc.language.iso | en | en |
dc.subject | Molybdenum Disulphide | en |
dc.subject | Mo/MoO3 thin films | en |
dc.subject | electron beam evaporation technique | en |
dc.subject | dielectric response behaviour | en |
dc.title | Growth of few layered molybdenum disulphide | en |
dc.type | Article | en |