Microwave induced chemical etching of CR-39 with KOH etchant: Comparison with chemical etching

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dc.contributor.authorSahoo, G. S.
dc.contributor.authorTripathy, S. P.
dc.contributor.authorJoshi, D. S.
dc.contributor.authorKulkarni, M. S.
dc.date.accessioned2019-12-10T11:29:18Z
dc.date.available2019-12-10T11:29:18Z
dc.date.issued2019
dc.description.divisionHPDen
dc.format.extent4783 bytes
dc.format.mimetypetext/html
dc.identifier.sourceNuclear Instruments & Methods in Physics Research-A, 2019. Vol. 935: pp. 143-147en
dc.identifier.urihttp://hdl.handle.net/123456789/20092
dc.language.isoenen
dc.subjectMicrowave induced chemical etchingen
dc.subjectChemical etchingen
dc.subjectCR-39en
dc.subjectBulk etch rateen
dc.subjectSolid state nuclear track detectoren
dc.titleMicrowave induced chemical etching of CR-39 with KOH etchant: Comparison with chemical etchingen
dc.typeArticleen

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