Tetrakis(trimethylsilyl)silane: Temperature dependence of vapor pressure, kinetics, and silicon carbide thin films by plasma-assisted liquid injection chemical vapor deposition process

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Date

2011

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Abstract

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Keywords

Chemical vapor deposition, Thermogravimetric analysis, Thermal properties, Scanning electron microscopy

Source

Materials Chemistry and Physics, 2011. Vol. 129 (1-2): pp. 62-67

URI

http://hdl.handle.net/123456789/5655

Collections

2011