Electron beam induced degradation of ofloxacin in aqueous solution: Kinetics, removal mechanism and cytotoxicity assessment

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dc.contributor.authorChangotra, R.
dc.contributor.authorGuin, J. P.
dc.contributor.authorKhader, S. A.
dc.contributor.authorVarshney, L.
dc.contributor.authorDhir, A.
dc.date.accessioned2019-05-23T08:21:31Z
dc.date.available2019-05-23T08:21:31Z
dc.date.issued2019
dc.description.divisionIRAD;RTDDen
dc.format.extent5111 bytes
dc.format.mimetypetext/html
dc.identifier.sourceChemical Engineering Journal, 2019. Vol. 356: pp. 973-984en
dc.identifier.urihttp://hdl.handle.net/123456789/18497
dc.language.isoenen
dc.subjectOfloxacinen
dc.subjectElectron beamen
dc.subjectDegradationen
dc.subjectGaussian calculationen
dc.subjectRemoval pathwaysen
dc.subjectCytotoxicityen
dc.titleElectron beam induced degradation of ofloxacin in aqueous solution: Kinetics, removal mechanism and cytotoxicity assessmenten
dc.typeArticleen

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