In situ X-ray photoelectron spectroscopy of Ag/Al bilayers grown by molecular beam epitaxy

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dc.contributor.authorAswal, D. K.
dc.contributor.authorMuthe, K. P.
dc.contributor.authorJoshi, N.
dc.contributor.authorDebnath, A. K.
dc.contributor.authorGupta, S. K.
dc.contributor.authorYakhmi, J. V.
dc.date.accessioned2021-09-20T05:31:49Z
dc.date.available2021-09-20T05:31:49Z
dc.date.issued2003
dc.description.divisionTPPEDen
dc.format.extent4043 bytes
dc.format.mimetypetext/html
dc.identifier.sourceJournal of Crystal Growth, 2003. Vol. 256 (42767): pp. 201-205en
dc.identifier.urihttp://hdl.handle.net/123456789/23476
dc.language.isoenen
dc.subjectBilayersen
dc.subjectDiffusionen
dc.subjectX-ray photoelectron spectroscopyen
dc.subjectMolecular beam epitaxyen
dc.titleIn situ X-ray photoelectron spectroscopy of Ag/Al bilayers grown by molecular beam epitaxyen
dc.typeArticleen

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