Substrate bias effects during diamond like carbon film deposition by microwave ECR plasma CVD

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dc.contributor.authorDey, R. M.
dc.contributor.authorSingh, S. B.
dc.contributor.authorBiswas, A.
dc.contributor.authorTokas, R. B.
dc.contributor.authorChand, N.
dc.contributor.authorVenkateshwaran, S.
dc.contributor.authorBhattacharya, D.
dc.contributor.authorSahoo, N. K.
dc.contributor.authorGosavi, S. W.
dc.contributor.authorKulkarni, S. K.
dc.contributor.authorPatil, D. S.
dc.date.accessioned2010-04-16T05:56:13Z
dc.date.available2010-04-16T05:56:13Z
dc.date.issued2008
dc.format.extent4365 bytes
dc.format.mimetypetext/html
dc.identifier.urihttp://hdl.handle.net/123456789/2224
dc.language.isoenen
dc.subjectDiamond like carbonen
dc.subjectElectron cyclotron resonanceen
dc.subjectAtomic force microscopyen
dc.subjectX-ray photoelectron spectroscopyen
dc.subjectSpectroscopic ellipsometryen
dc.subjectContact angleen
dc.subjectRoughnessen
dc.titleSubstrate bias effects during diamond like carbon film deposition by microwave ECR plasma CVDen
dc.typeArticleen

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