Process temperature-dependent interface quality and Maxwell-Wagner interfacial polarization in atomic layer deposited Al2O3/TiO2 nanolaminates for energy storage applications

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dc.contributor.authorPadhi, P. S.
dc.contributor.authorAjimsha, R. S.
dc.contributor.authorRai, S. K.
dc.contributor.authorGoutam, U. K.
dc.date.accessioned2024-04-16T10:56:45Z
dc.date.available2024-04-16T10:56:45Z
dc.date.issued2023
dc.description.divisionTPDen
dc.format.extent5471 bytes
dc.format.mimetypetext/html
dc.identifier.sourceNanoscale, 2023. Vol. 15: pp. 8337-8355en
dc.identifier.urihttp://hdl.handle.net/123456789/26690
dc.language.isoenen
dc.subjectProcess temperature-dependent interface qualityen
dc.subjectMaxwell-Wagner interfacial polarizationen
dc.subjectatomic layeren
dc.subjectAl2O3/TiO2 nanolaminatesen
dc.subjectenergy storage applicationsen
dc.titleProcess temperature-dependent interface quality and Maxwell-Wagner interfacial polarization in atomic layer deposited Al2O3/TiO2 nanolaminates for energy storage applicationsen
dc.typeArticleen

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