Absolute primary H atom quantum yield measurements in the 193.3 and 121.6 nm photodissociation of acetylene
dc.contributor.author | Lauter, A. | |
dc.contributor.author | Lee, K. S. | |
dc.contributor.author | Jung, K. H. | |
dc.contributor.author | Vatsa, R. K. | |
dc.contributor.author | Mittal, J. P. | |
dc.date.accessioned | 2019-07-10T10:12:50Z | |
dc.date.available | 2019-07-10T10:12:50Z | |
dc.date.issued | 2002 | |
dc.description.division | NM&SCD | en |
dc.format.extent | 4069 bytes | |
dc.format.mimetype | text/html | |
dc.identifier.source | Chemical Physics Letters, 2002. Vol. 358: pp. 314-319 | en |
dc.identifier.uri | http://hdl.handle.net/123456789/18841 | |
dc.language.iso | en | en |
dc.subject | Absolute primary H atom quantum yield measurements | en |
dc.subject | 193.3 and 121.6 nm photodissociation | en |
dc.subject | acetylene | en |
dc.subject | primary C2H2 photochemistry | en |
dc.title | Absolute primary H atom quantum yield measurements in the 193.3 and 121.6 nm photodissociation of acetylene | en |
dc.type | Article | en |