Thermal evolution of boron irradiation induced defects in predoped Si revealed by positron annihilation experiments
dc.contributor.author | Nambissan, P. M. G. | |
dc.contributor.author | Bhagwat, P. V. | |
dc.contributor.author | Kurup, M. B. | |
dc.date.accessioned | 2010-01-06T03:45:32Z | |
dc.date.available | 2010-01-06T03:45:32Z | |
dc.date.issued | 2007 | |
dc.format.extent | 4156 bytes | |
dc.format.mimetype | text/html | |
dc.identifier.uri | http://hdl.handle.net/123456789/1563 | |
dc.language.iso | en | en |
dc.subject | isochronal annealing behavior | en |
dc.subject | boron ion irradiation | en |
dc.subject | boron-doped silicon | en |
dc.subject | positron annihilation experiments | en |
dc.title | Thermal evolution of boron irradiation induced defects in predoped Si revealed by positron annihilation experiments | en |
dc.type | Article | en |