Microwave electron cyclotron resonance plasma metal organic chemical vapour deposition of Y2O3 coatings

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dc.contributor.authorBarve, A. A.
dc.contributor.authorNandurkar, N. S.
dc.contributor.authorChand, N.
dc.contributor.authorSingh, S. B.
dc.contributor.authorMithal, N.
dc.contributor.authorJagannath Bhanage, B. M.
dc.contributor.authorPatil, D. S.
dc.contributor.authorGantayet, L. M.
dc.date.accessioned2010-03-11T07:43:51Z
dc.date.available2010-03-11T07:43:51Z
dc.date.issued2008
dc.format.extent4109 bytes
dc.format.mimetypetext/html
dc.identifier.urihttp://hdl.handle.net/123456789/2070
dc.language.isoenen
dc.subjectY2O3 thin filmsen
dc.subjectmicrowave electron cyclotron resonanceen
dc.subjectplasma metal organic chemical vapour depositionen
dc.subjectOxygen plasma annealingen
dc.titleMicrowave electron cyclotron resonance plasma metal organic chemical vapour deposition of Y2O3 coatingsen
dc.typeArticleen

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