Use of chemical etching of CR-39 foils at elevated temperature for fast neutron personnel monitoring in India

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dc.contributor.authorSathian, D.
dc.contributor.authorRohatgi, R.
dc.contributor.authorJayalakshmi, V.
dc.contributor.authorMarathe, P. K.
dc.contributor.authorNair, S.
dc.contributor.authorKolekar, R. V.
dc.contributor.authorChourasiya, G.
dc.contributor.authorKannan, S.
dc.date.accessioned2010-08-16T07:51:12Z
dc.date.available2010-08-16T07:51:12Z
dc.date.issued2009
dc.format.extent4362 bytes
dc.format.mimetypetext/html
dc.identifier.urihttp://hdl.handle.net/123456789/3505
dc.language.isoenen
dc.subjectCR-39 foilsen
dc.subjectSSNTDen
dc.subjectchemical etchingen
dc.subjectfast neutron personnel monitoringen
dc.subjectimage analysis systemen
dc.titleUse of chemical etching of CR-39 foils at elevated temperature for fast neutron personnel monitoring in Indiaen
dc.typeArticleen

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