Laser Induced Damage Threshold of Ta2O5 and Ta2O5/SiO2 Films at 532 and 1064 nm

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dc.contributor.authorSunil Kumar
dc.contributor.authorShankar, A.
dc.contributor.authorKishore, N.
dc.contributor.authorMukherjee, C.
dc.contributor.authorKamparath, R.
dc.contributor.authorThakur, S.
dc.date.accessioned2019-05-23T10:55:28Z
dc.date.available2019-05-23T10:55:28Z
dc.date.issued2019
dc.description.divisionBARCen
dc.format.extent4285 bytes
dc.format.mimetypetext/html
dc.identifier.sourceOptik, 2019. Vol. 176: pp. 438-447en
dc.identifier.urihttp://hdl.handle.net/123456789/18507
dc.language.isoenen
dc.subjectQuarter wave thicknessen
dc.subjectReflectivityen
dc.subjectMultilayersen
dc.subjectDamage thresholden
dc.titleLaser Induced Damage Threshold of Ta2O5 and Ta2O5/SiO2 Films at 532 and 1064 nmen
dc.typeArticleen

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