Deposition and Characterization of High Tc thin films

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dc.contributor.authorShiv Kumar,
dc.date.accessioned2006-03-22T10:55:08Z
dc.date.available2006-03-22T10:55:08Z
dc.date.issued1995
dc.description.abstractSynopsis available in Thesisen
dc.description.divisionThesis awarded by University of Bombayen
dc.format.extent7003 bytes
dc.format.mimetypetext/html
dc.identifier.urihttp://hdl.handle.net/123456789/57
dc.language.isoenen
dc.publisherBhabha Atomic Research Centreen
dc.subjectThin filmsen
dc.subjectLaser ablationen
dc.subjectSputteringen
dc.subjectSuperconductorsen
dc.subjectYBa2Cu3Oxen
dc.subjectHigh Tcen
dc.subjectCurrent-voltage characteristicsen
dc.subjectVortex Dynamicsen
dc.subjectPinningen
dc.subjectfive probe techniqueen
dc.subjectFour probeen
dc.subjectPulse measurementsen
dc.subjectFlux creepen
dc.subjectFlux flowen
dc.titleDeposition and Characterization of High Tc thin filmsen
dc.typeThesisen

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