Deposition and in-situ characterization of Ti-Zr-V alloy thin films annealed at different temperatures under ultra-high vacuum conditions

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dc.contributor.authorSharma, R. K.
dc.contributor.authorJagannath
dc.contributor.authorBhattacharya, S.
dc.contributor.authorTokas, R. B.
dc.contributor.authorBhushan, K. G.
dc.contributor.authorSen, S.
dc.contributor.authorGadkari, S. C.
dc.contributor.authorGupta, S. K.
dc.date.accessioned2016-02-16T09:00:46Z
dc.date.available2016-02-16T09:00:46Z
dc.date.issued2015
dc.description.divisionTPD;A&MPDen
dc.format.extent4481 bytes
dc.format.mimetypetext/html
dc.identifier.sourceJournal of Alloys & Compounds, 2015. Vol. 651: pp. 375-381en
dc.identifier.urihttp://hdl.handle.net/123456789/12430
dc.language.isoenen
dc.subjectThin filmsen
dc.subjectMagnetron sputteringen
dc.subjectXPSen
dc.subjectNon-evaporable gettersen
dc.titleDeposition and in-situ characterization of Ti-Zr-V alloy thin films annealed at different temperatures under ultra-high vacuum conditionsen
dc.typeArticleen

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