Characterization of r.f. sputtered thin Mo, W and Si films as precursors to multilayer X-ray mirrors

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dc.contributor.authorBhattacharyya, D.
dc.contributor.authorJoseph, D.
dc.contributor.authorPoswal, A. K.
dc.date.accessioned2006-10-31T09:52:48Z
dc.date.available2006-10-31T09:52:48Z
dc.date.issued2006
dc.format.extent4626 bytes
dc.format.mimetypetext/html
dc.identifier.urihttp://hdl.handle.net/123456789/101
dc.language.isoenen
dc.subjectX-ray mirroren
dc.subjectX-ray reflectivityen
dc.subjectr.f. sputteringen
dc.titleCharacterization of r.f. sputtered thin Mo, W and Si films as precursors to multilayer X-ray mirrorsen
dc.typeArticleen

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