Electroless deposition, post annealing and characterization of nickel films on silicon

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dc.contributor.authorSabharwal, S.
dc.contributor.authorPalit, S.
dc.contributor.authorTokas, R. B.
dc.contributor.authorPoswal, A. K.
dc.contributor.authorSangeeta
dc.date.accessioned2010-07-06T08:41:19Z
dc.date.available2010-07-06T08:41:19Z
dc.date.issued2008
dc.format.extent3770 bytes
dc.format.mimetypetext/html
dc.identifier.urihttp://hdl.handle.net/123456789/2815
dc.language.isoenen
dc.subjectElectroless depositionen
dc.subjectX-ray diffractionen
dc.subjectscanning probe microscopyen
dc.subjectnickel filmen
dc.titleElectroless deposition, post annealing and characterization of nickel films on siliconen
dc.typeArticleen

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