Plasma process for development of a bulk heterojunction optoelectronic device: A highly sensitive UV detector

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dc.contributor.authorSharma, S.
dc.contributor.authorPal, A. R.
dc.contributor.authorChutia, J.
dc.contributor.authorBailung, H.
dc.contributor.authorSarma, N. S.
dc.contributor.authorDass, N. N.
dc.contributor.authorPatil, D.
dc.date.accessioned2013-01-01T09:08:11Z
dc.date.available2013-01-01T09:08:11Z
dc.date.issued2012
dc.description.divisionL&PTDen
dc.format.extent4735 bytes
dc.format.mimetypetext/html
dc.identifier.sourceApplied Surface Science, 2012. Vol. 258 (20): pp. 7897-7906en
dc.identifier.urihttp://hdl.handle.net/123456789/6944
dc.language.isoenen
dc.subjectPlasma polymerizationen
dc.subjectMagnetron sputteringen
dc.subjectConducting polymer nanocompositeen
dc.subjectOrganic photovoltaic deviceen
dc.titlePlasma process for development of a bulk heterojunction optoelectronic device: A highly sensitive UV detectoren
dc.typeArticleen

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