Deposition of Organosilicon Coatings by a Non-Equilibrium Atmospheric Pressure Plasma Jet: Design, Analysis and Macroscopic Scaling Law of the Process

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dc.contributor.authorPulpytel, J.
dc.contributor.authorVirendra Kumar
dc.contributor.authorPeng, P.
dc.contributor.authorMicheli, V.
dc.contributor.authorLaidani, N.
dc.contributor.authorArefi-Khonsari, F.
dc.date.accessioned2012-01-18T09:38:43Z
dc.date.available2012-01-18T09:38:43Z
dc.date.issued2011
dc.format.extent4634 bytes
dc.format.mimetypetext/html
dc.identifier.sourcePlasma Processes and Polymers, 2011. Vol. 8 (7): pp. 664-675en
dc.identifier.urihttp://hdl.handle.net/123456789/5707
dc.language.isoenen
dc.subjectDepositionen
dc.subjectOrganosilicon Coatingsen
dc.subjectNon-Equilibrium Atmospheric Pressure Plasma Jeten
dc.subjectDesign, Analysis and Macroscopic Scaling Lawen
dc.titleDeposition of Organosilicon Coatings by a Non-Equilibrium Atmospheric Pressure Plasma Jet: Design, Analysis and Macroscopic Scaling Law of the Processen
dc.typeArticleen

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