Study on the deposition velocity of 222Rn/220Rn progeny at varying environmental conditions

dc.contributor.authorPrajith, R.
dc.contributor.authorRout, R. P.
dc.contributor.authorMishra, R.
dc.contributor.authorJalaluddin, S.
dc.contributor.authorSapra, B. K.
dc.date.accessioned2024-07-16T07:27:22Z
dc.date.available2024-07-16T07:27:22Z
dc.date.issued2022
dc.description.divisionRP&ADen
dc.format.extent4898 bytes
dc.format.mimetypetext/html
dc.identifier.sourceJournal of Radioanalytical and Nuclear Chemistry, 2022. Vol. 331: pp. 5547-5555en
dc.identifier.urihttp://hdl.handle.net/123456789/26960
dc.language.isoenen
dc.subjectDTPS/DRPSen
dc.subjectDeposition velocityen
dc.subjectRelative humidityen
dc.subjectAerosol concentrationen
dc.subjectAir velocityen
dc.titleStudy on the deposition velocity of 222Rn/220Rn progeny at varying environmental conditionsen
dc.typeArticleen

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