Effect of etchant concentration on microwave induced chemical etching (MICE) of CR-39 detector

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dc.contributor.authorSahoo, G. S.
dc.contributor.authorTripathy, S. P.
dc.contributor.authorSharma, S. D.
dc.contributor.authorBandyopadhyay, T.
dc.date.accessioned2016-03-07T06:07:56Z
dc.date.available2016-03-07T06:07:56Z
dc.date.issued2015
dc.description.divisionHPD;RP&ADen
dc.format.extent4254 bytes
dc.format.mimetypetext/html
dc.identifier.sourceNuclear Instruments & Methods in Physics Research-A, 2015. Vol. 800: pp. 51-56en
dc.identifier.urihttp://hdl.handle.net/123456789/12594
dc.language.isoenen
dc.subjectCR-39en
dc.subjectMicrowave induced chemical etchingen
dc.subjectBulk etch rateen
dc.subjectEtchant concentrationen
dc.subjectMicrowave poweren
dc.titleEffect of etchant concentration on microwave induced chemical etching (MICE) of CR-39 detectoren
dc.typeArticleen

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