Secondary electron measurement and XPS characterization of NEG coatings

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dc.contributor.authorSharma, R. K.
dc.contributor.authorSinha, A. K.
dc.contributor.authorGupta, N.
dc.contributor.authorNuwad, J.
dc.contributor.authorJagannath
dc.contributor.authorGadkari, S. C.
dc.contributor.authorSingh, M. R.
dc.contributor.authorGupta, S. K.
dc.date.accessioned2015-05-13T09:46:24Z
dc.date.available2015-05-13T09:46:24Z
dc.date.issued2014
dc.description.divisionTPDen
dc.format.extent4180 bytes
dc.format.mimetypetext/html
dc.identifier.sourceAIP Conference Proceedings, 2014. Vol. 1591: pp. 916-918en
dc.identifier.urihttp://hdl.handle.net/123456789/11024
dc.language.isoenen
dc.subjectNEGen
dc.subjectActivation Temperatureen
dc.subjectSEYen
dc.titleSecondary electron measurement and XPS characterization of NEG coatingsen
dc.typeArticleen

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