Effect of deposition parameters on different stages of diamond deposition in HFCVD technique

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Date

2004

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Abstract

Description

Keywords

HFCVD, Pristine Si single crystal substrate, different stages of growth, Effect of bias, Pressure, SiC, Conversion of SiC to diamond

Source

Diamond and Related Materials, 2004. Vol. 13 (1): pp. 74-84

URI

http://hdl.handle.net/123456789/23162

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2004