New process for synthesis of nickel oxide thin films and their characterization

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dc.contributor.authorRaut, B. T.
dc.contributor.authorPawar, S. G.
dc.contributor.authorChougule, M. A.
dc.contributor.authorSen, S.
dc.contributor.authorPatil, V. B.
dc.date.accessioned2012-01-06T06:34:35Z
dc.date.available2012-01-06T06:34:35Z
dc.date.issued2011
dc.format.extent4312 bytes
dc.format.mimetypetext/html
dc.identifier.sourceJournal of Alloys and Compounds, 2011. Vol. 509 (37): pp. 9065-9070en
dc.identifier.urihttp://hdl.handle.net/123456789/5581
dc.language.isoenen
dc.subjectNickel oxideen
dc.subjectSol–gel methoden
dc.subjectStructural propertiesen
dc.subjectOptoelectronic propertiesen
dc.titleNew process for synthesis of nickel oxide thin films and their characterizationen
dc.typeArticleen

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