Diffusion of chromium and manganese in γ-TiAl
dc.contributor.author | Tiwari, G. P. | |
dc.contributor.author | Iijima, Y. | |
dc.contributor.author | Lee, C. G. | |
dc.contributor.author | Koo, B. H. | |
dc.date.accessioned | 2011-09-19T09:24:57Z | |
dc.date.available | 2011-09-19T09:24:57Z | |
dc.date.issued | 2011 | |
dc.format.extent | 4351 bytes | |
dc.format.mimetype | text/html | |
dc.identifier.source | Philosophical Magazine, 2011. Vol. 91 (5): pp. 751-771 | en |
dc.identifier.uri | http://hdl.handle.net/123456789/4968 | |
dc.language.iso | en | en |
dc.subject | γ-TiAl alloy | en |
dc.subject | intermetallic | en |
dc.subject | diffusion | en |
dc.subject | chromium | en |
dc.subject | manganese | en |
dc.subject | vacancy mechanism | en |
dc.title | Diffusion of chromium and manganese in γ-TiAl | en |
dc.type | Article | en |