Investigation of Mo/Si and W/Si Interfaces by Phase Modulated Spectroscopic Ellipsometry and Cross-Sectional Transmission Electron Microscopy
dc.contributor.author | Bhattacharyya, D. | |
dc.contributor.author | Poswal, A. K. | |
dc.contributor.author | Dey, G. K. | |
dc.contributor.author | Das, N. C. | |
dc.date.accessioned | 2019-09-24T09:04:01Z | |
dc.date.available | 2019-09-24T09:04:01Z | |
dc.date.issued | 2004 | |
dc.description.division | Spect. Div.;MSD | en |
dc.format.extent | 4053 bytes | |
dc.format.mimetype | text/html | |
dc.identifier.source | Vacuum, 2004. Vol. 76: pp. 31-36 | en |
dc.identifier.uri | http://hdl.handle.net/123456789/19509 | |
dc.language.iso | en | en |
dc.subject | Surface roughness | en |
dc.subject | Interface diffusion | en |
dc.subject | Spectroscopic Ellipsometry | en |
dc.subject | XTEM | en |
dc.title | Investigation of Mo/Si and W/Si Interfaces by Phase Modulated Spectroscopic Ellipsometry and Cross-Sectional Transmission Electron Microscopy | en |
dc.type | Article | en |