Effect of post deposition annealing on the performance of copper phthalocyanine based organic thin film transistor

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dc.contributor.authorPadma, N.
dc.contributor.authorSawant, S. N.
dc.contributor.authorSen, S.
dc.contributor.authorGupta, S. K.
dc.date.accessioned2014-04-07T08:43:33Z
dc.date.available2014-04-07T08:43:33Z
dc.date.issued2013
dc.description.divisionTPD;ChDen
dc.format.extent4004 bytes
dc.format.mimetypetext/html
dc.identifier.sourceAIP Conference Proceedings, 2013. Vol. 1512 (1): pp. 786-787en
dc.identifier.urihttp://hdl.handle.net/123456789/9019
dc.language.isoenen
dc.subjectOFETen
dc.subjectcopper phthalocyanineen
dc.subjectpost deposition annealingen
dc.subjectmobilityen
dc.subjectsubthreshold slopeen
dc.titleEffect of post deposition annealing on the performance of copper phthalocyanine based organic thin film transistoren
dc.typeArticleen

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