Control on wetting properties of spin-deposited silica films by surface silylation method

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dc.contributor.authorRao, A. V.
dc.contributor.authorLatthe, S. S.
dc.contributor.authorDhere, S. L.
dc.contributor.authorPawar, S. S.
dc.contributor.authorImai, H.
dc.contributor.authorGanesan, V.
dc.contributor.authorGupta, S. C.
dc.contributor.authorWagh, P. B.
dc.date.accessioned2011-01-14T05:32:42Z
dc.date.available2011-01-14T05:32:42Z
dc.date.issued2010
dc.format.extent4750 bytes
dc.format.mimetypetext/html
dc.identifier.sourceApplied Surface Science. Vol. 256 (7): pp. 2115-2121en
dc.identifier.urihttp://hdl.handle.net/123456789/4125
dc.language.isoenen
dc.subjectSol–gel processen
dc.subjectHydrophobicen
dc.subjectWettingen
dc.subjectTransparenten
dc.subjectHumidityen
dc.subjectCoatingsen
dc.titleControl on wetting properties of spin-deposited silica films by surface silylation methoden
dc.typeArticleen

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