Internal Stress in Electrodeposited Nanocrystalline Ni-Cu Alloys
dc.contributor.author | Ghosh, S. K. | |
dc.contributor.author | Grover, A. K. | |
dc.contributor.author | Totlani, M. K. | |
dc.date.accessioned | 2019-05-20T10:20:04Z | |
dc.date.available | 2019-05-20T10:20:04Z | |
dc.date.issued | 2002 | |
dc.description.division | MPD | en |
dc.format.extent | 3982 bytes | |
dc.format.mimetype | text/html | |
dc.identifier.source | Transactions of the IMF, 2002. Vol. 80 (2): pp. 56-59 | en |
dc.identifier.uri | http://hdl.handle.net/123456789/18443 | |
dc.language.iso | en | en |
dc.subject | Internal stress | en |
dc.subject | nanocrystalline | en |
dc.subject | electrodeposition | en |
dc.subject | alloy | en |
dc.subject | Ni-Cu | en |
dc.title | Internal Stress in Electrodeposited Nanocrystalline Ni-Cu Alloys | en |
dc.type | Article | en |