Preparation and characterization of nanocrystalline tin oxide thin films deposited at room temperature
dc.contributor.author | Deshpande, N. G. | |
dc.contributor.author | Vyas, J. C. | |
dc.contributor.author | Sharma, R. | |
dc.date.accessioned | 2010-04-16T04:47:05Z | |
dc.date.available | 2010-04-16T04:47:05Z | |
dc.date.issued | 2008 | |
dc.format.extent | 4152 bytes | |
dc.format.mimetype | text/html | |
dc.identifier.uri | http://hdl.handle.net/123456789/2222 | |
dc.language.iso | en | en |
dc.subject | Atomic force microscopy (AFM) | en |
dc.subject | Tin oxide | en |
dc.subject | X-ray diffraction | en |
dc.subject | M-SILAR | en |
dc.subject | Nanostructures | en |
dc.subject | Photoluminescence | en |
dc.title | Preparation and characterization of nanocrystalline tin oxide thin films deposited at room temperature | en |
dc.type | Article | en |