Characterization of ion beam sputter deposited W and Si films and W/Si interfaces by grazing incidence X-ray reflectivity, atomic force microscopy and spectroscopic ellipsometry

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dc.contributor.authorBiswas, A.
dc.contributor.authorPoswal, A. K.
dc.contributor.authorTokas, R. B.
dc.contributor.authorBhattacharyya, D.
dc.date.accessioned2010-03-15T10:01:30Z
dc.date.available2010-03-15T10:01:30Z
dc.date.issued2008
dc.format.extent3796 bytes
dc.format.mimetypetext/html
dc.identifier.urihttp://hdl.handle.net/123456789/2127
dc.language.isoenen
dc.subjectIBSen
dc.subjectGIXRen
dc.subjectSEen
dc.titleCharacterization of ion beam sputter deposited W and Si films and W/Si interfaces by grazing incidence X-ray reflectivity, atomic force microscopy and spectroscopic ellipsometryen
dc.typeArticleen

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