Design and development of a D.C. magnetron sputtering system for thin film and multilayer deposition

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dc.contributor.authorBhattacharya, D.
dc.contributor.authorBiswas, A.
dc.contributor.authorBhushan, K. G.
dc.contributor.authorSwain, M.
dc.contributor.authorBasu, S.
dc.date.accessioned2012-03-22T05:20:40Z
dc.date.available2012-03-22T05:20:40Z
dc.date.issued2011
dc.format.extent3786 bytes
dc.format.mimetypetext/html
dc.identifier.sourceAIP Conference Proceedings, 2011. Vol. 1349: pp. 487-488en
dc.identifier.urihttp://hdl.handle.net/123456789/5969
dc.language.isoenen
dc.subjectSputter depositionen
dc.subjectvacuum instrumentationen
dc.titleDesign and development of a D.C. magnetron sputtering system for thin film and multilayer depositionen
dc.typeArticleen

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