Efficient transformation of cyclohexane_g to methane, ethylene, and acetylene in argon dielectric barrier discharge is reported. In the absence of another H-atom donating source in the reaction mixture, such products’ generation suggests in situ fragmentation of a fraction of parent molecules to C₁ and C₂ stages, followed by preferential reactions of these fragments with H-atoms freed along. Simultaneous  formation of nonvolatile deposits containing diverse oxygenated and nonoxygenated long-chained aliphatic and cyclic compounds also occurred due to the remaining fraction’s reactions, including some with the unreacted parent and the adsorbed moisture on dielectric surfaces. The presence of 4% O₂ in the gas mixture induced a significant decrease in gas-phase hydrocarbons’ yields in addition to a change in the nonvolatile products’ nature.