In this paper, we report the fabrication of broadband antireflection porous nano-network on the glass substrate using the combination of candle soot and HF-based vapor phase etching method. Candle soot layer plays a key role to control the pore size during the etching process. Field emission electron microscopy results showed that the pores have the tapering profile, and the pores size was restricted to the sub-wavelength dimension. Therefore, an excellent broadband antireflection with an enhancement of ~7% in the maximum total transmittance as compared to plain glass has been achieved. Moreover, reflectance from the etched surface remains quite low (sc(DJ_sc/J_sc) of solar cell covered with the etched glass.