BARC/PUB/2019/0047

 
 

Composition dependent microstructure and optical properties of boron carbide (BxC) thin films deposited by radio frequency-plasma enhanced chemical vapour deposition technique

 
     
 
Author(s)

Bute, A.; Jena, S.; Bhattacharya, D.; S. Kumar; Chand, N.; Keskar, N.; Sinha, S.
(L&PSPS;A&MPD;SSPD;MMD)

Source

Materials Research Bulletin, 2019. Vol. 109: pp. 175-182

ABSTRACT

BxC thin films were deposited on silicon (100) and sodalime glass substrates using Radio Frequency Plasma Enhanced Chemical Vapour Deposition (RF-PECVD) technique, at different substrate self-bias varying from -100V to -250V. Optical property, structure and stoichiometry of the films were determined by spectrophotometry, X-ray diffraction and proton elastic backscattering spectrometric measurements respectively to investigate the effect of film composition on microstructure and optical properties. Film refractive index at a typical wavelength of 400 nm increased from 1.87 to 1.97 on account of increasing packing density of the films with substrate self- bias. Decrease in direct and indirect optical band gap with increasing substrate self-bias, has been explained on the basis of compositional variation i.e. boron/carbon stoichiometric ratio. Finally, soft X-ray reflectivity in the wavelength range of 40 Å–360 Å has been measured to explore its potential for application as optical material in this region of electromagnetic spectrum.

 
 
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