Optimization of deposition parameters of a dc magnetron sputtering system was performed to obtain good quality multilayer films of Cu/Ti. Two bilayers of Cu/Ti and Ti/Cu were deposited and characterized by X-Ray reflectometry (XRR) to obtain the structural parameters like thickness, roughness and density. Analyses of these XRR data helped optimize deposition parameters of a Cu/Ti multilayer, which was also characterized by XRR and found to be of very good reflectance with Bragg peaks visible up to 4^th order. Further the interface asymmetry observed in the bilayers as well as in the multilayer is also presented in this paper.