An ion beam deposited multilayer film of nominal thickness [Ni(200 Å)/Al(100 Å)]×5 on Si substrate has been characterized by X-Ray Diffraction(XRD), X-Ray Reflectivity (XRR) and Polarized neutron reflectivity(PNR). The present paper attempts to identify presence of any intermetallic compounds at the interfaces of the as-deposited sample. Structural parameters obtained from XRR and PNR are close to design values.