Chromium nitride coatings were deposited by reactive D.C. magnetron sputtering on stainless steel substrates varying the substrate biasing voltage and nitrogen flow rates and using chromium plated (>200 μm thick) stainless steel as the target (cathode). Coatings were characterised by X-ray diffraction analysis for the phases present and surface hardness values were measured by Knoop indentor. Electrochemical evaluation of the coatings was performed in de aerated I M H₂SO₄ solution at room temperature. CrN coatings had the typical hardness values ranging from 1300 -1600 HK₂₅. Increase in nitrogen flow (to total gas) from 9.5 to 13 % caused the corrosion resistance to increase rapidly (J_CTT reduced from 15/.4 to 54 μA cm^-2). Further increase in nitrogen flow ratio to 23% increased the corrosion resistance but very gradually. Increase in nitrogen flow beyond 23% caused the corrosion resistance to decrease. Coatings with the minimum current in the passive region were found to be those deposited at a F_N2 /F₁ of 16. 7%, the coating with the maximum hardness (1790 HK₂₅) showed the presence of CrTN as tile major phase. Increase in substrate biasing (-50 to -250 V) resulted in an increase in orrosion resistance (J_TT reduced from 159.6 to 18.4 μA cm^-2).